Imec has the most advanced chip manufacturing machine
Today, Imec, a world-leading research centre for advanced chip technology, announces the arrival of the ASML EXE:5200 High NA EUV lithography system. It is the most advanced chip manufacturing machine currently available. This significant step gives Imec’s partners early access to the next generation of chip technologies.
Chips smaller than 2 nanometres
The High NA EUV system works in conjunction with advanced measurement and manufacturing tools. This enables Imec, together with its partners, to develop chips smaller than 2 nanometres, delivering improved performance for artificial intelligence and high-performance computing.
Scaling up to industrial level
Luc Van den hove, CEO of Imec: “With the installation of the EXE:5200 High NA EUV lithography system in our 300mm cleanroom in Leuven (Belgium), we aim to bring these High NA EUV patterning technologies to an industry-relevant level and develop the next generation of High NA EUV patterning applications. The unrivalled resolution, improved overlay performance, high throughput and a new wafer stacker that enhances process stability and throughput give our partners a decisive advantage in accelerating the development of chips smaller than 2 nanometres.”
Strengthening Europe’s position
He adds: “As an integral part of the EU-funded NanoIC pilot line, the system will play a crucial role in strengthening Europe’s position as a leader in advanced semiconductor research in the coming decades.”
ASML and Imec
Christophe Fouquet, CEO of ASML: “The installation of the EXE:5200 at Imec marks an important step in the angstrom era. Together, we are accelerating the scalability of High NA EUV for the next generations of advanced memory and computing power.”
Imec expects the EXE:5200 High NA EUV lithography system to be fully operational by the fourth quarter of 2026.